Ultra Clean Processing of Semiconductor Surfaces XV
Paul W. Mertens · Kurt Wostyn · Marc Meuris · Marc Heyns
Feb 2021 · Trans Tech Publications Ltd
Ebook
340
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About this ebook
This proceedings volume describes the recent progress in the field of ultra-clean surfaces and surface cleaning and preparation for the production of micro- and nanoelectronic integrated circuits and related subjects. This involves a wide variety of surfaces of mixed composition and with nano-topography with an aspect ratio of lateral dimension/vertical dimension on the order of 1/10. The goal of the processes is to obtain nano precise etching and cleaning, resulting in ultra-clean surfaces with very few residues or defects. This comprises different surface and cleaning steps throughout the entire device manufacturing process.
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