Pattern Analysis and Understanding: Edition 2

· Springer Series in Information Sciences 4권 · Springer Science & Business Media
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In this second edition every chapter of the first edition of Pattern Analysis has been updated and expanded. The general view of a system for pattern analysis and understanding has remained unchanged, but many details have been revised. A short account of light and sound has been added to the introduction, some normalization techniques and a basic introduction to morphological operations have been added to the second chapter. Chapter 3 has been expanded significantly by topics like motion, depth, and shape from shading; additional material has also been added to the already existing sections of this chapter. The old sections of Chap. 4 have been reorganized, a general view of the classification problem has been added and material provided to incorporate techniques of word and object recognition and to give a short account of some types of neural nets. Almost no changes have been made in Chap. 5. The part on representation of control structures in Chap. 6 has been shortened, a section on the judgement of results has been added. Chapter 7 has been rewritten almost completely; the section on formal grammars has been reduced, the sections on production systems, semantic networks, and knowledge acquisition have been expanded, and sections on logic and explanation added. The old Chaps. 8 and 9 have been omitted. In summary, the new edition is a thorough revision and extensive update of the first one taking into account the progress in the field during recent years.

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